Future trends in microelectronics. journey into the unknown by Serge Luryi, Jimmy Xu, Alexander Zaslavsky

By Serge Luryi, Jimmy Xu, Alexander Zaslavsky

The e-book offers the longer term advancements and recommendations within the constructing box of microelectronics. The book’s chapters comprise contributions from a number of authors, all of whom are top execs affiliated both with best universities, significant semiconductor businesses, or govt laboratories, discussing the evolution in their occupation. a variety of microelectronic-related fields are tested, together with solid-state electronics, fabric technological know-how, optoelectronics, bioelectronics, and renewable energies. the subjects lined diversity from basic actual ideas, fabrics and equipment applied sciences, and significant new industry possibilities.

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7 nm,” Presented at Intern. Workshop EUV Sources, Dublin, Ireland (2010). 37. T. Tsarfati, R. W. E. van de Kruijs, E. Zoethout, E. Louis, and F. 7 nm wavelength radiation sources and next generation lithography,” Thin Solid Films 518, 1365–1368 (2009). 3 What Happened to Post-CMOS? P. M. Solomon IBM, T. J. Watson Research Center, Yorktown Heights, NY 10598, USA 1. ❦ Introduction At this date of writing, we should be approaching the end of CMOS as the premier IT logic technology with new “beyond CMOS” nanotechnologies waiting in the wings.

Silicon photonics technology Data center traffic has been and will be continuously increasing as people use more connected devices. 9 billion in 2014 to 25 billion in 2020. 40 In order to meet the bandwidth demand, data centers will expand the deployment of optical interconnects. 41 Research on Si photonics is ongoing to reduce the cost of optical interconnects and accelerate the replacement of copper wire. 44 Photonic devices are fabricated using locally crystallized silicon on a bulk Si substrate that allows lower material cost and process compatibility with CMOS transistors.

Hanna, H. Wei, V. Vaenkatesan, H. Megens, and D. Slotboom, “Overlay and edge placement control strategies for the 7-nm node using EUV and ArF lithography,” Proc. SPIE 9422, 94221Q (2015). 13. M. P. Stoykovich and P. F. Nealey, “Block copolymers and conventional lithography,” Mater. Today 9, 20–29 (2006). 14. C. T. Black, “Polymer self-assembly as a novel extension to optical lithography,” ACS Nano 1, 147–150 (2007). 15. I. Bita, J. K. W. Yang, S. J. Yeon, C. A. Ross, E. L. Thomas, and K. K. Berggren, “Graphoepitaxy of self-assembled block copolymers on 2D periodic patterned templates,” Science 321, 939–943 (2008).

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